Phase Shifting Masks for Microlithography

by Mr Tapan Shah (School of Technology and Computer Science)

Friday 18 May 2012, 15:00 → 16:30 Asia/Kolkata

A-212 (STCS Seminar Room) (Colaba Campus)

I will introduce the problem of mask design in a lithographic process from a systems perspective and show how it can be reduced to a non-linear optimization problem. I will also show the benefit of phase shift mask over the binary mask with some examples. Lastly, I will show how a complex mask can be replaced by successive real valued masks (double exposure theorem).